BTU International to highlight next generation thermal processing capabilities at EU PVSEC 2010

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“We know the marketplace is becoming more challenging for our customers. We are tackling these challenges by offering equipment that is designed for high productivity with a focus on lowering cost per watt and capex per watt,” said Jan-Paul van Maaren, Ph.D., vice president marketing at BTU. “This year at EU PVSEC we will be highlighting our next generation technology in a truly innovative way.”

BTU will showcase its in-line process systems that can dramatically lower cost without sacrificing cell efficiencies. For silicon photovoltaics, BTU will feature the Tritan drying and firing furnace. The Tritan includes TriSpeed technology that enables aggressive temperature spikes without compromising the drying, burnout and cooling process steps. For phosphorus diffusion, BTU’s solution is the Meridian in-line diffusion system, the industry’s most successful in-line diffusion system with well over one gigawatt in customer commitments.

In thin film photovoltaics, BTU leverages its technologies and decades of experience to provide scalable, custom, in-line thermal process systems for rigid as well as flexible substrates.

Two technical posters will be presented by BTU during the conference portion of EU PVSEC. Both will be presented on Wednesday, September 8. The first presentation is titled “Phosphorous Dopant Surface Conformality: a comparison study between inline and POCl3 diffused mono Si wafers.” The second is “Surface passivation of silicon solar cells by inline thermal oxidation.” BTU’s technical staff will be available in the booth to discuss these and other technical results.

http://www.btu.com