The purpose of the tool is to remove the highly doped layer from the backside and the edges of a wafer, and thereby produce a chemical edge isolation (CEI). In a second process step, the remaining phosphor silicate glass layer on the front side of the wafer that was created during the previous diffusion process step, is removed. Throughput will be up to 4,800 wafers per hour. The machine will be sold as a bundle with the Manz SpeedPicker for loading and unloading. Manz will follow up with new vacuum coating equipment and a new texturing tool soon.
This content is protected by copyright and may not be reused. If you want to cooperate with us and would like to reuse some of our content, please contact: email@example.com.
By submitting this form you agree to pv magazine using your data for the purposes of publishing your comment.
Your personal data will only be disclosed or otherwise transmitted to third parties for the purposes of spam filtering or if this is necessary for technical maintenance of the website. Any other transfer to third parties will not take place unless this is justified on the basis of applicable data protection regulations or if pv magazine is legally obliged to do so.
You may revoke this consent at any time with effect for the future, in which case your personal data will be deleted immediately. Otherwise, your data will be deleted if pv magazine has processed your request or the purpose of data storage is fulfilled.
Further information on data privacy can be found in our Data Protection Policy.