INDEOtec supplies Octopus PECVD tool to U.S. research group

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INDEOtec is continuing to introduce its Plasma-enhance chemical vapor deposition tooling to research bodies, with its latest to go to an unnamed U.S. laboratory. The tool will be shipped in Q1 2016.

The Octopus II system can be utilized in HJT cell production, with the ability to deposit an intrinsic and doped amorphous silicon layer onto mono or multicrystalline cells. INDEOtec reports it has been able to achieve cell efficiencies in excess of 22% with the tool.

pv magazine understands that this latest Octopus II tool order is for a southwestern U.S. research group. The order comes additionally to a similar supply deal with France’s IPVF announced last month.

One of the advantages of the INDEOtec Octopus II system is that it enables both top and bottom side thin film deposition, without the cell being flipped and without breaking vacuum. The Octopus II system additionally allows for low plasma ignition levels, in what the company says results in superior film thickness uniformity and “excellent” passivation.

INDEOtec says that the Octopus system reduces the need for additional “non value adding handling and treatment steps” making it suitable for mass production.

The company is located in Neuchatel, Switzerland, with much of the team originating from the now-defunct a-Si equipment supplier Oerlikon Solar.