INDEOtec will supply the University with its package for both PECVD and PVD processes, which are vital in the production of high efficiency thin film cell concepts, including heterojunction.
“At KAUST we have been looking for a deposition system offering high flexibility, proven reliability and very low maintenance requirements,” says Stefaan De Wolf, Associate Professor at the university, “all of which we can find in INDEOtec’s OCTOPUS II platform.”
INDEOtec’s platform can deposit a range of materials onto a crystalline silicon cell, and significantly reduces substrate handling and avoids vacuum breakage between to and bottom side deposition cycles, according to the company.
“This order underlines the strong confidence in the platform concept for a broad range of investigations at high performance PV cell architectures,” state Indeotec in a press release, “as well as the ever increasing institutional recognition of Indeotec’s technologies for thin-film coating solutions.
INDEOtec, based in Neuchâtel, just outside the Swiss capital of Bern, has supplied its OCTOPUS II platform to several other research institutes in the past, including the French Institute for Photvoltaics IPVF, and an unnamed laboratory in the U.S.
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